Publication:
Contact layer printing at 0.28k1 by means of double line exposure and negative tone development
Date
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0009-0001-2424-1322 | |
| cris.virtual.orcid | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0000-0003-3075-3479 | |
| cris.virtualsource.department | b4f8c238-ae6a-4a36-b09f-6a93bec3afa5 | |
| cris.virtualsource.department | 2de2f471-f2b5-41d4-b237-dca99c2395be | |
| cris.virtualsource.department | 8f5fd27d-55ef-418c-94c3-d9a8ce4a3e5c | |
| cris.virtualsource.orcid | b4f8c238-ae6a-4a36-b09f-6a93bec3afa5 | |
| cris.virtualsource.orcid | 2de2f471-f2b5-41d4-b237-dca99c2395be | |
| cris.virtualsource.orcid | 8f5fd27d-55ef-418c-94c3-d9a8ce4a3e5c | |
| dc.contributor.author | Bekaert, Joost | |
| dc.contributor.author | Maenhoudt, Mireille | |
| dc.contributor.author | Vandenberghe, Geert | |
| dc.contributor.author | Reybrouck, Mario | |
| dc.contributor.imecauthor | Bekaert, Joost | |
| dc.contributor.imecauthor | Vandenberghe, Geert | |
| dc.contributor.imecauthor | Reybrouck, Mario | |
| dc.contributor.orcidimec | Bekaert, Joost::0000-0003-3075-3479 | |
| dc.date.accessioned | 2021-10-17T06:16:26Z | |
| dc.date.available | 2021-10-17T06:16:26Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2008 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13363 | |
| dc.source.conference | 5th International Symposium on Immersion Lithography Extensions | |
| dc.source.conferencedate | 22/09/2008 | |
| dc.source.conferencelocation | Den Haag Nederland | |
| dc.title | Contact layer printing at 0.28k1 by means of double line exposure and negative tone development | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | Original bundle
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| Publication available in collections: |