Publication:

Finite element modeling of PAG leaching and water uptake in immersion lithography resist materials

Date

2008
Proceedings Paper
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dc.contributor.authorRathsack, Ben
dc.contributor.authorScheer, Steven
dc.contributor.authorKuwahara, Yuhei
dc.contributor.authorKitano, Junichi
dc.contributor.authorGronheid, Roel
dc.contributor.authorBaerts, Christina
dc.contributor.imecauthorScheer, Steven
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorBaerts, Christina
dc.date.accessioned2021-10-17T10:06:59Z
dc.date.available2021-10-17T10:06:59Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14363
dc.source.beginpage692315
dc.source.conferenceAdvances in Resist Materials and Processing Technology XXV
dc.source.conferencedate24/02/2008
dc.source.conferencelocationSan Jose, CA USA
dc.title

Finite element modeling of PAG leaching and water uptake in immersion lithography resist materials

dc.typeProceedings paper
dspace.entity.typePublication
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