Publication:

Comparison of pattern placement errors as measured using traditional overlay targets and design rule structures

Date

2003
Proceedings Paper
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cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
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cris.virtual.orcid0000-0003-4055-3366
cris.virtual.orcid0000-0002-1086-270X
cris.virtual.orcid0000-0002-4266-6500
cris.virtualsource.department6f4aef74-21b9-4cda-96ec-9f6ac3224834
cris.virtualsource.departmentf9ae71b7-6a7c-4af7-9261-89511f8785c1
cris.virtualsource.department82fbecb6-a915-4354-8ca7-fdcb5a3d9f37
cris.virtualsource.orcid6f4aef74-21b9-4cda-96ec-9f6ac3224834
cris.virtualsource.orcidf9ae71b7-6a7c-4af7-9261-89511f8785c1
cris.virtualsource.orcid82fbecb6-a915-4354-8ca7-fdcb5a3d9f37
dc.contributor.authorLeray, Philippe
dc.contributor.authorLaidler, David
dc.contributor.authorPollentier, Ivan
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorLaidler, David
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.accessioned2021-10-15T05:22:23Z
dc.date.available2021-10-15T05:22:23Z
dc.date.embargo9999-12-31
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7797
dc.source.beginpage49
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XVII
dc.source.conferencedate23/02/2003
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage60
dc.title

Comparison of pattern placement errors as measured using traditional overlay targets and design rule structures

dc.typeProceedings paper
dspace.entity.typePublication
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