Publication:
Investigation of instrinsic transistor performance of advanced CMOS devices with 2.5 nm NO gate oxides
Date
| dc.contributor.author | Kubicek, Stefan | |
| dc.contributor.author | Henson, W. K. | |
| dc.contributor.author | De Keersgieter, An | |
| dc.contributor.author | Badenes, Gonçal | |
| dc.contributor.author | Jansen, Philippe | |
| dc.contributor.author | van Meer, Hans | |
| dc.contributor.author | Kerr, Daniel | |
| dc.contributor.author | Naem, Abdalla | |
| dc.contributor.author | Deferm, Ludo | |
| dc.contributor.author | De Meyer, Kristin | |
| dc.contributor.imecauthor | Kubicek, Stefan | |
| dc.contributor.imecauthor | De Keersgieter, An | |
| dc.contributor.imecauthor | Deferm, Ludo | |
| dc.contributor.imecauthor | De Meyer, Kristin | |
| dc.date.accessioned | 2021-10-06T11:34:07Z | |
| dc.date.available | 2021-10-06T11:34:07Z | |
| dc.date.issued | 1999 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3575 | |
| dc.source.beginpage | 823 | |
| dc.source.conference | International Electron Devices Meeting. Technical Digest; 5-8 Dec. 1999; Washington, D.C., USA. | |
| dc.source.endpage | 826 | |
| dc.title | Investigation of instrinsic transistor performance of advanced CMOS devices with 2.5 nm NO gate oxides | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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