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A modified capacitance / voltage technique to characterize copper drift diffusion in organic low-K dielectrics

Date

2000
Proceedings Paper
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dc.contributor.authorLanckmans, Filip
dc.contributor.authorGeenen, Luc
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorMaex, Karen
dc.date.accessioned2021-10-14T13:13:41Z
dc.date.available2021-10-14T13:13:41Z
dc.date.embargo9999-12-31
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4512
dc.source.beginpage409
dc.source.conferenceAdvanced Metallization Conference 1999 - AMC 1999
dc.source.conferencedate28/09/1999
dc.source.conferencelocationOrlando, FL USA
dc.source.endpage415
dc.title

A modified capacitance / voltage technique to characterize copper drift diffusion in organic low-K dielectrics

dc.typeProceedings paper
dspace.entity.typePublication
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