Publication:

Validation of CD-SEM etching residue evaluation technique for MuGFET structures

Date

2009
Proceedings Paper
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cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0009-0001-2277-3958
cris.virtual.orcid0000-0002-8062-3165
cris.virtualsource.department396b9467-2161-4a7a-bb47-9db73e169cd2
cris.virtualsource.departmentc807a03a-358d-4274-b622-dee889a60454
cris.virtualsource.orcid396b9467-2161-4a7a-bb47-9db73e169cd2
cris.virtualsource.orcidc807a03a-358d-4274-b622-dee889a60454
dc.contributor.authorIsawa, Miki
dc.contributor.authorTanaka, Maki
dc.contributor.authorMaeda, Tatsuya
dc.contributor.authorWatanabe, Kenji
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorCollaert, Nadine
dc.contributor.authorRooyackers, Rita
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.accessioned2021-10-17T23:07:17Z
dc.date.available2021-10-17T23:07:17Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15525
dc.source.beginpage72720Q
dc.source.conferenceMetrology, Inspection and Process Control for Microlithography XXIII
dc.source.conferencedate22/02/2009
dc.source.conferencelocationSan Jose, CA USA
dc.title

Validation of CD-SEM etching residue evaluation technique for MuGFET structures

dc.typeProceedings paper
dspace.entity.typePublication
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