Study of porogen removal by atomic hydrogen generated by hot wire chemical vapor deposition for the fabrication of advanced low-k thin films

dc.contributor.author	Godavarthi, Srinivas
dc.contributor.author	Wang, Cong
dc.contributor.author	Verdonck, Patrick
dc.contributor.author	Matsumoto, Y.
dc.contributor.author	Koudriavtsev, I
dc.contributor.author	Dutt, A.
dc.contributor.author	Tielens, Hilde
dc.contributor.author	Baklanov, Mikhaïl
dc.contributor.imecauthor	Verdonck, Patrick
dc.contributor.imecauthor	Tielens, Hilde
dc.contributor.orcidimec	Verdonck, Patrick::0000-0003-2454-0602
dc.date.accessioned	2021-10-22T19:26:20Z
dc.date.available	2021-10-22T19:26:20Z
dc.date.issued	2015
dc.identifier.issn	0040-6090
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/25321
dc.identifier.url	http://dx.doi.org/10.1016/j.tsf.2014.10.033
dc.source.beginpage	103
dc.source.endpage	106
dc.source.journal	Thin Solid Films
dc.source.volume	575
dc.title	Study of porogen removal by atomic hydrogen generated by hot wire chemical vapor deposition for the fabrication of advanced low-k thin films
dc.type	Journal article
dspace.entity.type	Publication
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