Publication:
Natural EUV mask blank defects: evidence, timely detection, analysis and outlook
Date
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0000-0003-2211-9443 | |
| cris.virtual.orcid | 0009-0008-6879-2178 | |
| cris.virtual.orcid | 0000-0003-2516-0417 | |
| cris.virtual.orcid | 0000-0003-0803-4267 | |
| cris.virtualsource.department | 386aec34-c796-442e-8812-e827cd030994 | |
| cris.virtualsource.department | 45b3c197-6661-4f60-a2ed-4a867012d28f | |
| cris.virtualsource.department | 80b06157-bd8a-4926-8696-c8e23bf10e77 | |
| cris.virtualsource.department | 987ea135-86ab-40b5-a86e-f94391ccf5fe | |
| cris.virtualsource.orcid | 386aec34-c796-442e-8812-e827cd030994 | |
| cris.virtualsource.orcid | 45b3c197-6661-4f60-a2ed-4a867012d28f | |
| cris.virtualsource.orcid | 80b06157-bd8a-4926-8696-c8e23bf10e77 | |
| cris.virtualsource.orcid | 987ea135-86ab-40b5-a86e-f94391ccf5fe | |
| dc.contributor.author | Van Den Heuvel, Dieter | |
| dc.contributor.author | Jonckheere, Rik | |
| dc.contributor.author | Magana, John | |
| dc.contributor.author | Abe, Tsukasa | |
| dc.contributor.author | Bret, Tristan | |
| dc.contributor.author | Hendrickx, Eric | |
| dc.contributor.author | Cheng, Shaunee | |
| dc.contributor.author | Ronse, Kurt | |
| dc.contributor.imecauthor | Van Den Heuvel, Dieter | |
| dc.contributor.imecauthor | Jonckheere, Rik | |
| dc.contributor.imecauthor | Hendrickx, Eric | |
| dc.contributor.imecauthor | Ronse, Kurt | |
| dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
| dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
| dc.date.accessioned | 2021-10-18T22:54:13Z | |
| dc.date.available | 2021-10-18T22:54:13Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2010 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/18160 | |
| dc.source.beginpage | 78231T | |
| dc.source.conference | Photomask Technology 2010 | |
| dc.source.conferencedate | 13/09/2010 | |
| dc.source.conferencelocation | Monterey, CA USA | |
| dc.title | Natural EUV mask blank defects: evidence, timely detection, analysis and outlook | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | Original bundle
| |
| Publication available in collections: |