Publication:

Extending EUV lithography for DRAM applications

Date

2020
Proceedings Paper
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dc.contributor.authorRispens, Gijsbert
dc.contributor.authorVan Lare, C.
dc.contributor.authorOorschot, D.
dc.contributor.authorHoefnagels, R.
dc.contributor.authorLiu, S.
dc.contributor.authorVan Mierlo, W.
dc.contributor.authorZuurbier, N.
dc.contributor.authorDardani, Z.
dc.contributor.authorWang, Z.
dc.contributor.authorMaslow, M.
dc.contributor.authorFinders, J.
dc.contributor.authorFallica, Roberto
dc.contributor.authorFrommhold, Andreas
dc.contributor.authorHendrickx, Eric
dc.contributor.authorNiroomand, A.
dc.contributor.authorLight, S.
dc.contributor.imecauthorRispens, Gijsbert
dc.contributor.imecauthorFallica, Roberto
dc.contributor.imecauthorFrommhold, Andreas
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecFallica, Roberto::0000-0003-4523-9624
dc.contributor.orcidimecFrommhold, Andreas::0000-0001-6824-5643
dc.date.accessioned2021-10-29T03:04:51Z
dc.date.available2021-10-29T03:04:51Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35836
dc.identifier.urlhttps://www.spiedigitallibrary.org/conference-proceedings-of-spie/11323/113230U/Extending-EUV-lithography-for-DRAM-applications/10.1117/12.2552067.full?SSO=1
dc.source.beginpage113230U
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography XI
dc.source.conferencedate20/02/2020
dc.source.conferencelocationSan Jose USA
dc.title

Extending EUV lithography for DRAM applications

dc.typeProceedings paper
dspace.entity.typePublication
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