Publication:

193nm immersion lithography for high performance silicon photonic circuits

Date

 
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0003-0778-2669
cris.virtual.orcid0000-0003-0747-0462
cris.virtual.orcid0000-0003-1112-8950
cris.virtual.orcid0000-0003-0111-431X
cris.virtual.orcid0000-0002-6833-220X
cris.virtualsource.department00e049bc-79d0-4325-b281-791064db1c14
cris.virtualsource.departmentd0f017c0-379f-4adc-98c3-5fb9de8f1b9e
cris.virtualsource.departmentabd4c200-97e4-4c07-9ea0-e8e329dccb4d
cris.virtualsource.departmentba97b4e2-c6d5-45c4-b9b4-75cedecd7d74
cris.virtualsource.department0ec81bcc-d43f-4489-99f0-e6cd9aa2c9a4
cris.virtualsource.orcid00e049bc-79d0-4325-b281-791064db1c14
cris.virtualsource.orcidd0f017c0-379f-4adc-98c3-5fb9de8f1b9e
cris.virtualsource.orcidabd4c200-97e4-4c07-9ea0-e8e329dccb4d
cris.virtualsource.orcidba97b4e2-c6d5-45c4-b9b4-75cedecd7d74
cris.virtualsource.orcid0ec81bcc-d43f-4489-99f0-e6cd9aa2c9a4
dc.contributor.authorSelvaraja, Shankar
dc.contributor.authorAbsil, Philippe
dc.contributor.authorVan Campenhout, Joris
dc.contributor.authorWinroth, Gustaf
dc.contributor.authorMurdoch, Gayle
dc.contributor.authorLocorotondo, Sabrina
dc.contributor.authorMilenin, Alexey
dc.contributor.authorDelvaux, Christie
dc.contributor.authorOng, Patrick
dc.contributor.authorSterckx, Gunther
dc.contributor.authorLepage, Guy
dc.contributor.authorPathak, Shibnath
dc.contributor.authorBogaerts, Wim
dc.contributor.authorVan Thourhout, Dries
dc.contributor.authorXie, Weiqiang
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorVan Campenhout, Joris
dc.contributor.imecauthorMurdoch, Gayle
dc.contributor.imecauthorLocorotondo, Sabrina
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorOng, Patrick
dc.contributor.imecauthorSterckx, Gunther
dc.contributor.imecauthorLepage, Guy
dc.contributor.imecauthorBogaerts, Wim
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.orcidimecVan Campenhout, Joris::0000-0003-0778-2669
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecOng, Patrick::0000-0002-2072-292X
dc.contributor.orcidimecBogaerts, Wim::0000-0003-1112-8950
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.date.accessioned2021-10-22T05:40:19Z
dc.date.available2021-10-22T05:40:19Z
dc.date.embargo9999-12-31
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24505
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1857374
dc.source.beginpage90520F
dc.source.conferenceOptical Microlithography XXVII
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Francisco, CA United States of America
dc.title

193nm immersion lithography for high performance silicon photonic circuits

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
28210.pdf
Size:
868.43 KB
Format:
Adobe Portable Document Format
Publication available in collections: