Publication:
193nm immersion lithography for high performance silicon photonic circuits
Date
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
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| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0000-0003-0778-2669 | |
| cris.virtual.orcid | 0000-0003-0747-0462 | |
| cris.virtual.orcid | 0000-0003-1112-8950 | |
| cris.virtual.orcid | 0000-0003-0111-431X | |
| cris.virtual.orcid | 0000-0002-6833-220X | |
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| cris.virtualsource.orcid | 0ec81bcc-d43f-4489-99f0-e6cd9aa2c9a4 | |
| dc.contributor.author | Selvaraja, Shankar | |
| dc.contributor.author | Absil, Philippe | |
| dc.contributor.author | Van Campenhout, Joris | |
| dc.contributor.author | Winroth, Gustaf | |
| dc.contributor.author | Murdoch, Gayle | |
| dc.contributor.author | Locorotondo, Sabrina | |
| dc.contributor.author | Milenin, Alexey | |
| dc.contributor.author | Delvaux, Christie | |
| dc.contributor.author | Ong, Patrick | |
| dc.contributor.author | Sterckx, Gunther | |
| dc.contributor.author | Lepage, Guy | |
| dc.contributor.author | Pathak, Shibnath | |
| dc.contributor.author | Bogaerts, Wim | |
| dc.contributor.author | Van Thourhout, Dries | |
| dc.contributor.author | Xie, Weiqiang | |
| dc.contributor.imecauthor | Absil, Philippe | |
| dc.contributor.imecauthor | Van Campenhout, Joris | |
| dc.contributor.imecauthor | Murdoch, Gayle | |
| dc.contributor.imecauthor | Locorotondo, Sabrina | |
| dc.contributor.imecauthor | Milenin, Alexey | |
| dc.contributor.imecauthor | Delvaux, Christie | |
| dc.contributor.imecauthor | Ong, Patrick | |
| dc.contributor.imecauthor | Sterckx, Gunther | |
| dc.contributor.imecauthor | Lepage, Guy | |
| dc.contributor.imecauthor | Bogaerts, Wim | |
| dc.contributor.imecauthor | Van Thourhout, Dries | |
| dc.contributor.orcidimec | Van Campenhout, Joris::0000-0003-0778-2669 | |
| dc.contributor.orcidimec | Milenin, Alexey::0000-0003-0747-0462 | |
| dc.contributor.orcidimec | Ong, Patrick::0000-0002-2072-292X | |
| dc.contributor.orcidimec | Bogaerts, Wim::0000-0003-1112-8950 | |
| dc.contributor.orcidimec | Van Thourhout, Dries::0000-0003-0111-431X | |
| dc.date.accessioned | 2021-10-22T05:40:19Z | |
| dc.date.available | 2021-10-22T05:40:19Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2014 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/24505 | |
| dc.identifier.url | http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1857374 | |
| dc.source.beginpage | 90520F | |
| dc.source.conference | Optical Microlithography XXVII | |
| dc.source.conferencedate | 23/02/2014 | |
| dc.source.conferencelocation | San Francisco, CA United States of America | |
| dc.title | 193nm immersion lithography for high performance silicon photonic circuits | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | Original bundle
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| Publication available in collections: |