Publication:

Non-destructive techniques for identification and control of processing induced extended defects in silicon and correlation with device yield

Date

1997
Journal article
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dc.contributor.authorVanhellemont, Jan
dc.contributor.authorMilita, S.
dc.contributor.authorServidori, M.
dc.contributor.authorHiggs, V.
dc.contributor.authorKissinger, G.
dc.contributor.authorGramenova, Emilia
dc.contributor.authorSimoen, Eddy
dc.contributor.authorJansen, Philippe
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.accessioned2021-09-30T09:58:33Z
dc.date.available2021-09-30T09:58:33Z
dc.date.embargo9999-12-31
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2271
dc.source.beginpage1425
dc.source.endpage1433
dc.source.journalJournal de Physique III
dc.source.volume7
dc.title

Non-destructive techniques for identification and control of processing induced extended defects in silicon and correlation with device yield

dc.typeJournal article
dspace.entity.typePublication
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