Publication:

300mm wafer level WS2 p-MOS capacitor characterization, smulation, and analysis

Date

 
dc.contributor.authorKoladi Mootheri, Vivek
dc.contributor.authorOkuyama, Atsushi
dc.contributor.authorSmets, Quentin
dc.contributor.authorSchram, Tom
dc.contributor.authorAsselberghs, Inge
dc.contributor.authorHeyns, Marc
dc.contributor.authorRadu, Iuliana
dc.contributor.authorLin, Dennis
dc.contributor.imecauthorKoladi Mootheri, Vivek
dc.contributor.imecauthorOkuyama, Atsushi
dc.contributor.imecauthorSmets, Quentin
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorAsselberghs, Inge
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.imecauthorLin, Dennis
dc.contributor.orcidimecKoladi Mootheri, Vivek::0000-0002-1373-8405
dc.contributor.orcidimecSmets, Quentin::0000-0002-2356-5915
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.date.accessioned2021-10-28T23:26:33Z
dc.date.available2021-10-28T23:26:33Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35404
dc.identifier.urlhttps://www.ieeesisc.org/programs/2020_SISC_technical_program.pdf
dc.source.beginpage5.2
dc.source.conference51st IEEE Semiconductor Interface Specialist Conference - SISC 2020
dc.source.conferencedate16/12/2020
dc.source.conferencelocationonline online
dc.title

300mm wafer level WS2 p-MOS capacitor characterization, smulation, and analysis

dc.typeMeeting abstract
dspace.entity.typePublication
Files
Publication available in collections: