Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Conference contributions
Influence of photoresist and BARC selection on the efficiency of a post-etch wet strip in BEOL applications
Publication:
Influence of photoresist and BARC selection on the efficiency of a post-etch wet strip in BEOL applications
Copy permalink
Date
2010
Meeting abstract
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
20913.pdf
240.47 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kesters, Els
;
Lux, Marcel
;
Pittevils, Joris
;
Baeyens, Jonas
;
Vereecke, Guy
;
Struyf, Herbert
Journal
Abstract
Description
Metrics
Views
1822
since deposited on 2021-10-18
1
last month
Acq. date: 2025-12-16
Citations
Metrics
Views
1822
since deposited on 2021-10-18
1
last month
Acq. date: 2025-12-16
Citations