Publication:

Relationship between resist outgassing and witness sample contamination in NXE outgas qualification using electrons and EUV

Date

2013
Proceedings Paper
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cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0002-4266-6500
cris.virtualsource.department82fbecb6-a915-4354-8ca7-fdcb5a3d9f37
cris.virtualsource.orcid82fbecb6-a915-4354-8ca7-fdcb5a3d9f37
dc.contributor.authorPollentier, Ivan
dc.contributor.authorLokasani, Ragava
dc.contributor.authorGronheid, Roel
dc.contributor.authorHill, S.
dc.contributor.authorTarrio, C.
dc.contributor.authorLucatorto, T.
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorGronheid, Roel
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.accessioned2021-10-21T11:02:08Z
dc.date.available2021-10-21T11:02:08Z
dc.date.embargo9999-12-31
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22946
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1675249
dc.source.beginpage86790K
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography IV
dc.source.conferencedate24/02/2013
dc.source.conferencelocationSan Jose, CA USA
dc.title

Relationship between resist outgassing and witness sample contamination in NXE outgas qualification using electrons and EUV

dc.typeProceedings paper
dspace.entity.typePublication
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