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XPS study of the cleaning efficiency by ozone processes of protective films formed by reactive ion etching of Co and Ti silicides
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XPS study of the cleaning efficiency by ozone processes of protective films formed by reactive ion etching of Co and Ti silicides
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Date
1998
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Conard, Thierry
;
De Gendt, Stefan
;
Baklanov, Mikhaïl
;
Vos, Rita
;
Heyns, Marc
;
Vandervorst, Wilfried
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1921
since deposited on 2021-09-30
1
last month
Acq. date: 2026-02-26
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Statistics
Views
1921
since deposited on 2021-09-30
1
last month
Acq. date: 2026-02-26
Citations