Publication:
Highly sensitive monitoring of Ru etching using optical emission
Date
| dc.contributor.author | Shamiryan, Denis | |
| dc.contributor.author | Baklanov, Mikhaïl | |
| dc.contributor.author | Boullart, Werner | |
| dc.contributor.imecauthor | Boullart, Werner | |
| dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
| dc.date.accessioned | 2021-10-16T04:59:00Z | |
| dc.date.available | 2021-10-16T04:59:00Z | |
| dc.date.issued | 2005-07 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/11190 | |
| dc.source.beginpage | G176 | |
| dc.source.endpage | G178 | |
| dc.source.issue | 7 | |
| dc.source.journal | Electrochemical and Solid-State Letters | |
| dc.source.volume | 8 | |
| dc.title | Highly sensitive monitoring of Ru etching using optical emission | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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