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Use of a thermally degradable chemical vapor deposited polymer film for low damage plasma processing of highly porous dielectrics
Publication:
Use of a thermally degradable chemical vapor deposited polymer film for low damage plasma processing of highly porous dielectrics
Date
2019
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
de Marneffe, Jean-Francois
;
Yamaguchi, Tatsuya
;
Fujikawa, Makoto
;
Rezvanov, Askar
;
Chanson, Romain
;
Zhang, Jianran
;
Babaei Gavan, Khashayar
;
El Otell, Ziad
;
Nozawa, S.
;
Kikuchi, Y.
;
Maekawa, Kaoru
Journal
ACS Applied Electronic Materials
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2060
since deposited on 2021-10-27
Acq. date: 2025-10-24
Citations
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Views
2060
since deposited on 2021-10-27
Acq. date: 2025-10-24
Citations