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Use of a thermally degradable chemical vapor deposited polymer film for low damage plasma processing of highly porous dielectrics
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Use of a thermally degradable chemical vapor deposited polymer film for low damage plasma processing of highly porous dielectrics
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Date
2019
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
de Marneffe, Jean-Francois
;
Yamaguchi, Tatsuya
;
Fujikawa, Makoto
;
Rezvanov, Askar
;
Chanson, Romain
;
Zhang, Jianran
;
Babaei Gavan, Khashayar
;
El Otell, Ziad
;
Nozawa, S.
;
Kikuchi, Y.
;
Maekawa, Kaoru
Journal
ACS Applied Electronic Materials
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2062
since deposited on 2021-10-27
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Acq. date: 2025-12-11
Citations
Metrics
Views
2062
since deposited on 2021-10-27
1
last month
Acq. date: 2025-12-11
Citations