Publication:
Progressive degradation of TiN/SiON and TiN/HfO2 gate stack triple gate SOI nFinFETs subjected to electrical stress
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1903 since deposited on 2021-10-17
2last month
Acq. date: 2026-08-08
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Statistics
Views
1903 since deposited on 2021-10-17
2last month
Acq. date: 2026-08-08
Citations