Publication:
Progressive degradation of TiN/SiON and TiN/HfO2 gate stack triple gate SOI nFinFETs subjected to electrical stress
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1904 since deposited on 2021-10-17
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Acq. date: 2026-08-31
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Statistics
Views
1904 since deposited on 2021-10-17
1last month
1last week
Acq. date: 2026-08-31
Citations