Publication:
Etching of HfO2, deposited on LPCVD Si3N4, and cleaning of Hf residues
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2013 since deposited on 2021-10-15
7last month
1last week
Acq. date: 2026-04-06
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Statistics
Views
2013 since deposited on 2021-10-15
7last month
1last week
Acq. date: 2026-04-06
Citations