Publication:
Etching of HfO2, deposited on LPCVD Si3N4, and cleaning of Hf residues
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2008 since deposited on 2021-10-15
5last month
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Acq. date: 2026-03-17
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Statistics
Views
2008 since deposited on 2021-10-15
5last month
1last week
Acq. date: 2026-03-17
Citations