Publication:
Silicon surface texturing by reactive ion etching
Date
| dc.contributor.author | Dekkers, Harold | |
| dc.contributor.author | Duerinckx, Filip | |
| dc.contributor.author | Szlufcik, Jozef | |
| dc.contributor.author | Nijs, Johan | |
| dc.contributor.imecauthor | Dekkers, Harold | |
| dc.contributor.imecauthor | Duerinckx, Filip | |
| dc.contributor.imecauthor | Szlufcik, Jozef | |
| dc.contributor.orcidimec | Dekkers, Harold::0000-0003-4778-5709 | |
| dc.contributor.orcidimec | Duerinckx, Filip::0000-0003-2570-7371 | |
| dc.date.accessioned | 2021-10-14T12:51:59Z | |
| dc.date.available | 2021-10-14T12:51:59Z | |
| dc.date.issued | 2000 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/4305 | |
| dc.source.beginpage | 311 | |
| dc.source.endpage | 316 | |
| dc.source.issue | 4 | |
| dc.source.journal | Opto-Electronics Review | |
| dc.source.volume | 8 | |
| dc.title | Silicon surface texturing by reactive ion etching | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |