Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Conference contributions
Integration of the 3MS low-k CVD material in a 0.18 μm Cu single damascene process
Publication:
Integration of the 3MS low-k CVD material in a 0.18 μm Cu single damascene process
Copy permalink
Date
2000
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
4372.pdf
387.94 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Gao, Teng
;
Gray, William
;
Van Hove, Marleen
;
Struyf, Herbert
;
Meynen, Herman
;
Vanhaelemeersch, Serge
;
Maex, Karen
Journal
Abstract
Description
Metrics
Downloads
2
since deposited on 2021-10-14
Acq. date: 2025-12-10
Views
1960
since deposited on 2021-10-14
1
last month
Acq. date: 2025-12-10
Citations
Metrics
Downloads
2
since deposited on 2021-10-14
Acq. date: 2025-12-10
Views
1960
since deposited on 2021-10-14
1
last month
Acq. date: 2025-12-10
Citations