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Integration of the 3MS low-k CVD material in a 0.18 μm Cu single damascene process
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2 since deposited on 2021-10-14
Acq. date: 2026-01-06
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1960 since deposited on 2021-10-14
Acq. date: 2026-01-07
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2 since deposited on 2021-10-14
Acq. date: 2026-01-06
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1960 since deposited on 2021-10-14
Acq. date: 2026-01-07
Citations