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Conference contributions
Impact of backside process on high aspect ratio via-middle Cu through silicon via reliability
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Impact of backside process on high aspect ratio via-middle Cu through silicon via reliability
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Date
2017
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Li, Yunlong
;
Van Huylenbroeck, Stefaan
;
De Vos, Joeri
;
Stucchi, Michele
;
Croes, Kristof
;
Beyer, Gerald
;
Beyne, Eric
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Views
1796
since deposited on 2021-10-24
2
last month
1
last week
Acq. date: 2026-07-18
Citations