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Low temperature selective growth of heavily boron-doped germanium source /drain layers for advanced pMOS devices

Date

2020
Journal article
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dc.contributor.authorPorret, Clément
dc.contributor.authorVohra, Anurag
dc.contributor.authorNakazaki, Nobuya
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorDouhard, Bastien
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorRosseel, Erik
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorLanger, Robert
dc.contributor.authorLoo, Roger
dc.contributor.imecauthorPorret, Clément
dc.contributor.imecauthorVohra, Anurag
dc.contributor.imecauthorNakazaki, Nobuya
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorLanger, Robert
dc.contributor.imecauthorLoo, Roger
dc.contributor.orcidimecPorret, Clément::0000-0002-4561-348X
dc.contributor.orcidimecVohra, Anurag::0000-0002-2831-0719
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecLanger, Robert::0000-0002-1132-3468
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-29T02:20:08Z
dc.date.available2021-10-29T02:20:08Z
dc.date.issued2020
dc.identifier.issn1862-6300
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35757
dc.identifier.urlhttps://doi.org/10.1002/pssa.201900628
dc.source.beginpage1900628
dc.source.issue3
dc.source.journalPhysica Status Solidi A
dc.source.volume217
dc.title

Low temperature selective growth of heavily boron-doped germanium source /drain layers for advanced pMOS devices

dc.typeJournal article
dspace.entity.typePublication
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