Publication:

Performance of a linear single wafer IPA vapour based drying system

Date

2004
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dc.contributor.authorFyen, Wim
dc.contributor.authorArnauts, Sophia
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorDoumen, Geert
dc.contributor.authorVereecke, Guy
dc.contributor.authorVan Steenbergen, Jan
dc.contributor.authorMertens, Paul
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorDoumen, Geert
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorVan Steenbergen, Jan
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.accessioned2021-10-15T13:29:33Z
dc.date.available2021-10-15T13:29:33Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8932
dc.source.conference7th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate20/09/2004
dc.source.conferencelocationBrussel BElgium
dc.title

Performance of a linear single wafer IPA vapour based drying system

dc.typeOral presentation
dspace.entity.typePublication
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