Publication:
Work function of Ni3Si2 on HfSixOy and SiO2 and its implication for Ni fully silicided gate applications
Date
| dc.contributor.author | Kittl, Jorge | |
| dc.contributor.author | O'Sullivan, Barry | |
| dc.contributor.author | Kaushik, Vidya | |
| dc.contributor.author | Lauwers, Anne | |
| dc.contributor.author | Pawlak, M.A. | |
| dc.contributor.author | Hoffmann, Thomas Y. | |
| dc.contributor.author | Demeurisse, Caroline | |
| dc.contributor.author | Vrancken, Christa | |
| dc.contributor.author | Veloso, Anabela | |
| dc.contributor.author | Absil, Philippe | |
| dc.contributor.author | Biesemans, Serge | |
| dc.contributor.imecauthor | O'Sullivan, Barry | |
| dc.contributor.imecauthor | Lauwers, Anne | |
| dc.contributor.imecauthor | Demeurisse, Caroline | |
| dc.contributor.imecauthor | Vrancken, Christa | |
| dc.contributor.imecauthor | Veloso, Anabela | |
| dc.contributor.imecauthor | Absil, Philippe | |
| dc.contributor.imecauthor | Biesemans, Serge | |
| dc.contributor.orcidimec | O'Sullivan, Barry::0000-0002-9036-8241 | |
| dc.date.accessioned | 2021-10-16T17:08:27Z | |
| dc.date.available | 2021-10-16T17:08:27Z | |
| dc.date.issued | 2007-01 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/12405 | |
| dc.source.beginpage | 32103 | |
| dc.source.issue | 3 | |
| dc.source.journal | Applied Physics Letters | |
| dc.source.volume | 90 | |
| dc.title | Work function of Ni3Si2 on HfSixOy and SiO2 and its implication for Ni fully silicided gate applications | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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