Characterization of Doping and Activation Processes Using Differential Hall Effect Metrology (DHEM)

dc.contributor.author	Joshi, Abhijeet
dc.contributor.author	Rengo, Gianluca
dc.contributor.author	Porret, Clément
dc.contributor.author	Lin, Kun-Lin
dc.contributor.author	Chang, Chia-He
dc.contributor.author	Basol, Bulent
dc.contributor.imecauthor	Rengo, Gianluca
dc.contributor.imecauthor	Porret, Clément
dc.contributor.orcidimec	Porret, Clément::0000-0002-4561-348X
dc.date.accessioned	2022-04-29T07:36:48Z
dc.date.available	2021-12-15T16:46:42Z
dc.date.available	2022-04-29T07:36:48Z
dc.date.issued	2021-05
dc.identifier.issn	na
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/38611
dc.source.beginpage	1009
dc.source.conference	239th ECS Meeting: G01: Silicon Compatible Emerging Materials, Processes, and Technologies for Advanced CMOS and Post-CMOS Applications 11
dc.source.conferencedate	2021/05/30 - 2021/06/03
dc.source.conferencelocation	Virtual
dc.source.journal	ECS Meeting Abstracts
dc.source.numberofpages	1
dc.title	Characterization of Doping and Activation Processes Using Differential Hall Effect Metrology (DHEM)
dc.type	Meeting abstract
dspace.entity.type	Publication
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