Publication:

Plasma processing of low-k dielectrics

Date

2012
Book Chapter
Simple item page Full metadata Statistics
 
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0001-5178-6670
cris.virtualsource.departmentbce8c338-4d24-430a-a452-479a72e43639
cris.virtualsource.orcidbce8c338-4d24-430a-a452-479a72e43639
dc.contributor.authorShi, Hualiang
dc.contributor.authorShamiryan, Denis
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorHuang, Huai
dc.contributor.authorHo, Paul
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.date.accessioned2021-10-20T16:02:54Z
dc.date.available2021-10-20T16:02:54Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21499
dc.source.beginpage79
dc.source.bookAdvanced Interconnects for ULSI Technology
dc.source.endpage128
dc.title

Plasma processing of low-k dielectrics

dc.typeBook chapter
dspace.entity.typePublication
Files

Original bundle

Name:
23666.pdf
Size:
94.04 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Book chapters