Publication:
Atomically controlled processing for Si and Ge CVD epitaxial growth
Date
| dc.contributor.author | Murota, Junichi | |
| dc.contributor.author | Yamamoto, Yuchi | |
| dc.contributor.author | Costina, I. | |
| dc.contributor.author | Tillack, Bernd | |
| dc.contributor.author | Le Thanh, Vin | |
| dc.contributor.author | Loo, Roger | |
| dc.contributor.author | Caymax, Matty | |
| dc.contributor.imecauthor | Loo, Roger | |
| dc.contributor.imecauthor | Caymax, Matty | |
| dc.contributor.orcidimec | Loo, Roger::0000-0003-3513-6058 | |
| dc.date.accessioned | 2021-10-23T13:08:29Z | |
| dc.date.available | 2021-10-23T13:08:29Z | |
| dc.date.issued | 2016 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/27058 | |
| dc.identifier.url | http://ma.ecsdl.org/content/MA2016-01/16/988.abstract | |
| dc.source.beginpage | 988 | |
| dc.source.conference | 229th ECS Meeting: Symposium D01: Dielectrics for Nanosystems 7: Materials Science, Processing, Reliability, and Manufacturing | |
| dc.source.conferencedate | 29/05/2016 | |
| dc.source.conferencelocation | San Diego, CA USA | |
| dc.title | Atomically controlled processing for Si and Ge CVD epitaxial growth | |
| dc.type | Meeting abstract | |
| dspace.entity.type | Publication | |
| Files | ||
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