Publication:

Si/SiGe resonant interband tunnel diodes grown by large-area chemical vapor deposition

Date

2013-10
Proceedings Paper
https://doi.org/10.1149/05809.0081ecst
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dc.contributor.authorBerger, Paul R.
dc.contributor.authorRamesh, Anisha
dc.contributor.authorLoo, Roger
dc.contributor.imecauthorLoo, Roger
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-21T06:45:50Z
dc.date.available2021-10-21T06:45:50Z
dc.date.issued2013-10
dc.identifier.doi10.1149/05809.0081ecst
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22035
dc.source.beginpage81
dc.source.conferenceULSI Process Integration 8
dc.source.conferencedate27/10/2013
dc.source.conferencelocationSan Francisco, CA USA
dc.source.endpage88
dc.title

Si/SiGe resonant interband tunnel diodes grown by large-area chemical vapor deposition

dc.typeProceedings paper
dspace.entity.typePublication
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