Publication:

Hydrogen induced and plasma charging enhanced positive charge generation in gate oxides

Date

2000
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorZhao, C.Z.
dc.contributor.authorZhang, J.F.
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorDegraeve, Robin
dc.contributor.authorEllis, J. N.
dc.contributor.authorBeech, C. D.
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorDegraeve, Robin
dc.date.accessioned2021-10-14T14:24:50Z
dc.date.available2021-10-14T14:24:50Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4973
dc.source.beginpage129
dc.source.conference5th International Symposium on Plasma Process-Induced Damage
dc.source.conferencedate23/05/2000
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage132
dc.title

Hydrogen induced and plasma charging enhanced positive charge generation in gate oxides

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions