Publication:
Silicide-induced stress in Si: origin and consequences for MOS technologies
Date
| dc.contributor.author | Steegen, An | |
| dc.contributor.author | Maex, Karen | |
| dc.contributor.imecauthor | Maex, Karen | |
| dc.date.accessioned | 2021-10-14T23:14:41Z | |
| dc.date.available | 2021-10-14T23:14:41Z | |
| dc.date.issued | 2002 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/6847 | |
| dc.source.beginpage | 1 | |
| dc.source.endpage | 53 | |
| dc.source.issue | 1 | |
| dc.source.journal | Materials Science & Engineering R. Reports | |
| dc.source.volume | 38 | |
| dc.title | Silicide-induced stress in Si: origin and consequences for MOS technologies | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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