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Transition from anomalous kinetics toward Fickian diffusion for Si dissolution into amorphous Ge

Date

2008
Journal article
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dc.contributor.authorBalogh, Z.
dc.contributor.authorErdelyi, Z.
dc.contributor.authorBeke, D.L.
dc.contributor.authorLanger, G.
dc.contributor.authorCsik, A.
dc.contributor.authorBoyen, H.G.
dc.contributor.authorWiedwald, U.
dc.contributor.authorZiemann, P.
dc.contributor.authorPortavoce, A.
dc.contributor.authorGirardeaux, C.
dc.date.accessioned2021-10-17T06:14:51Z
dc.date.available2021-10-17T06:14:51Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.issn0003-6951
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13335
dc.source.beginpage143104
dc.source.issue14
dc.source.journalApplied Physics Letters
dc.source.volume92
dc.title

Transition from anomalous kinetics toward Fickian diffusion for Si dissolution into amorphous Ge

dc.typeJournal article
dspace.entity.typePublication
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