Publication:

Low temperature oxidation and selective etching of chemical vapor deposition a-SiC:H films

Date

2000
Journal article
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dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorMannaert, Geert
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorBender, Hugo
dc.contributor.authorConard, Thierry
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.accessioned2021-10-14T12:40:13Z
dc.date.available2021-10-14T12:40:13Z
dc.date.embargo9999-12-31
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4092
dc.source.beginpage1281
dc.source.endpage1287
dc.source.issue3
dc.source.journalJ. Vacuum Science and Technology B
dc.source.volume18
dc.title

Low temperature oxidation and selective etching of chemical vapor deposition a-SiC:H films

dc.typeJournal article
dspace.entity.typePublication
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