Publication:
Low temperature oxidation and selective etching of chemical vapor deposition a-SiC:H films
Date
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0000-0003-2102-7395 | |
| cris.virtual.orcid | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0009-0003-1267-5355 | |
| cris.virtual.orcid | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0000-0002-4298-5851 | |
| cris.virtualsource.department | be666b23-db12-4330-ba46-4774d0d61a5e | |
| cris.virtualsource.department | aa278ea5-787e-4cf9-b811-072acf5b1d4d | |
| cris.virtualsource.department | 3303f61f-8f71-4733-bc6e-22f2714a9d67 | |
| cris.virtualsource.department | bb9c66a8-60a0-4f4b-9c7c-d1ca7e7f5571 | |
| cris.virtualsource.department | 6bca2580-fe8c-4b07-87e1-c34fbfbb75ce | |
| cris.virtualsource.orcid | be666b23-db12-4330-ba46-4774d0d61a5e | |
| cris.virtualsource.orcid | aa278ea5-787e-4cf9-b811-072acf5b1d4d | |
| cris.virtualsource.orcid | 3303f61f-8f71-4733-bc6e-22f2714a9d67 | |
| cris.virtualsource.orcid | bb9c66a8-60a0-4f4b-9c7c-d1ca7e7f5571 | |
| cris.virtualsource.orcid | 6bca2580-fe8c-4b07-87e1-c34fbfbb75ce | |
| dc.contributor.author | Baklanov, Mikhaïl | |
| dc.contributor.author | Van Hove, Marleen | |
| dc.contributor.author | Mannaert, Geert | |
| dc.contributor.author | Vanhaelemeersch, Serge | |
| dc.contributor.author | Bender, Hugo | |
| dc.contributor.author | Conard, Thierry | |
| dc.contributor.author | Maex, Karen | |
| dc.contributor.imecauthor | Mannaert, Geert | |
| dc.contributor.imecauthor | Vanhaelemeersch, Serge | |
| dc.contributor.imecauthor | Bender, Hugo | |
| dc.contributor.imecauthor | Conard, Thierry | |
| dc.contributor.imecauthor | Maex, Karen | |
| dc.contributor.orcidimec | Vanhaelemeersch, Serge::0000-0003-2102-7395 | |
| dc.contributor.orcidimec | Conard, Thierry::0000-0002-4298-5851 | |
| dc.date.accessioned | 2021-10-14T12:40:13Z | |
| dc.date.available | 2021-10-14T12:40:13Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2000 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/4092 | |
| dc.source.beginpage | 1281 | |
| dc.source.endpage | 1287 | |
| dc.source.issue | 3 | |
| dc.source.journal | J. Vacuum Science and Technology B | |
| dc.source.volume | 18 | |
| dc.title | Low temperature oxidation and selective etching of chemical vapor deposition a-SiC:H films | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | Original bundle
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| Publication available in collections: |