Publication:
Low damage cryogenic etching of low-k materials for advanced interconnects
Date
| dc.contributor.author | Baklanov, Mikhaïl | |
| dc.contributor.author | Zhang, Liping | |
| dc.contributor.author | de Marneffe, Jean-Francois | |
| dc.contributor.author | Dussart, Remi | |
| dc.contributor.author | Goodyear, Andy | |
| dc.contributor.imecauthor | Zhang, Liping | |
| dc.contributor.imecauthor | de Marneffe, Jean-Francois | |
| dc.date.accessioned | 2021-10-22T00:44:44Z | |
| dc.date.available | 2021-10-22T00:44:44Z | |
| dc.date.issued | 2014 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/23517 | |
| dc.source.beginpage | 59 | |
| dc.source.conference | 23rd Conference on Materials for Advanced Metallization - MAM | |
| dc.source.conferencedate | 2/03/2014 | |
| dc.source.conferencelocation | Chemnitz Germany | |
| dc.source.endpage | 60 | |
| dc.title | Low damage cryogenic etching of low-k materials for advanced interconnects | |
| dc.type | Meeting abstract | |
| dspace.entity.type | Publication | |
| Files | ||
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