Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Conference contributions
Development and evaluation of a-SiCO:H films as Cu and moisture diffusion barriers with a low dielectric constant, for advanced interconnects
Publication:
Development and evaluation of a-SiCO:H films as Cu and moisture diffusion barriers with a low dielectric constant, for advanced interconnects
Copy permalink
Date
2013
Meeting abstract
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
26005.pdf
983.24 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Van Besien, Els
;
Singh, Arjun
;
Barbarin, Yohan
;
Verdonck, Patrick
;
Baklanov, Mikhaïl
Journal
Abstract
Description
Metrics
Views
1891
since deposited on 2021-10-21
Acq. date: 2025-12-10
Citations
Metrics
Views
1891
since deposited on 2021-10-21
Acq. date: 2025-12-10
Citations