Publication:

Introducing 157nm full field lithography

Date

2003
Journal article
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cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0002-8297-5076
cris.virtual.orcid0000-0003-1249-8902
cris.virtualsource.departmentbf23291b-8cd7-495b-b210-564de11c9d4f
cris.virtualsource.department1bb8b4e6-2ffe-43d0-8928-327961840fc6
cris.virtualsource.orcidbf23291b-8cd7-495b-b210-564de11c9d4f
cris.virtualsource.orcid1bb8b4e6-2ffe-43d0-8928-327961840fc6
dc.contributor.authorGoethals, Mieke
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorHermans, Jan
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorHermans, Jan
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.date.accessioned2021-10-15T04:48:07Z
dc.date.available2021-10-15T04:48:07Z
dc.date.embargo9999-12-31
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7615
dc.source.beginpage549
dc.source.endpage556
dc.source.issue4
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.volume16
dc.title

Introducing 157nm full field lithography

dc.typeJournal article
dspace.entity.typePublication
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