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Photoresist treatment using an ICP H2 plasma and low ESC temperature: LWR study
Publication:
Photoresist treatment using an ICP H2 plasma and low ESC temperature: LWR study
Date
2014
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
De Schepper, Peter
;
Altamirano Sanchez, Efrain
;
Goodyear, Andy
;
El Otell, Ziad
;
de Marneffe, Jean-Francois
;
De Gendt, Stefan
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1901
since deposited on 2021-10-22
411
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Acq. date: 2025-10-25
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Metrics
Views
1901
since deposited on 2021-10-22
411
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations