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The future of lithography

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cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0003-0803-4267
cris.virtualsource.department987ea135-86ab-40b5-a86e-f94391ccf5fe
cris.virtualsource.orcid987ea135-86ab-40b5-a86e-f94391ccf5fe
dc.contributor.authorRonse, Kurt
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-19T18:15:40Z
dc.date.available2021-10-19T18:15:40Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.issn0038-111X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19704
dc.identifier.urlhttp://www.electroiq.com/index/display/semiconductors-article-display/7921500372/articles/solid-state-technology/volume-54/issue
dc.source.beginpage13
dc.source.endpage16
dc.source.issue2
dc.source.journalSolid State Technology
dc.source.volume54
dc.title

The future of lithography

dc.typeJournal article
dspace.entity.typePublication
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