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Performance optimization of the double-exposure alternating PSM for (sub-)100-nm ICs

Date

2002
Proceedings Paper
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dc.contributor.authorVandenberghe, Geert
dc.contributor.authorDriessen, Frank
dc.contributor.authorVan Adrichem, Paul
dc.contributor.authorRonse, Kurt
dc.contributor.authorLi, Jason
dc.contributor.authorKarklin, Linard
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorVan Adrichem, Paul
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-14T23:41:41Z
dc.date.available2021-10-14T23:41:41Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6969
dc.source.beginpage394
dc.source.conference21st Annual BACUS Symposium on Photomask Technology
dc.source.conferencedate3/10/2001
dc.source.conferencelocationMonterey, CA USA
dc.source.endpage405
dc.title

Performance optimization of the double-exposure alternating PSM for (sub-)100-nm ICs

dc.typeProceedings paper
dspace.entity.typePublication
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