Publication:

Atomic layer deposition and remote plasma surface preparation for gate stack applications

Date

2003
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorDelabie, Annelies
dc.contributor.authorCaymax, Matty
dc.contributor.authorBrijs, Bert
dc.contributor.authorCartier, E.
dc.contributor.authorGeenen, Luc
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorBajolet, Philippe
dc.contributor.authorMaes, Jan
dc.contributor.authorTsai, Wilman
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-15T04:28:41Z
dc.date.available2021-10-15T04:28:41Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7487
dc.source.beginpage12
dc.source.conferenceProceedings AVS 4th International Conference on Microelectronics and Interfaces - ICMI
dc.source.conferencedate3/03/2003
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage15
dc.title

Atomic layer deposition and remote plasma surface preparation for gate stack applications

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions