Publication:
Extending logic metal printing with sub-resolution grating in high and hyper NA EUV lithography
| dc.contributor.author | Lee, Inhwan | |
| dc.contributor.author | Franke, Joern-Holger | |
| dc.contributor.author | Philipsen, Vicky | |
| dc.contributor.author | Ronse, Kurt | |
| dc.contributor.author | De Gendt, Stefan | |
| dc.contributor.author | Hendrickx, Eric | |
| dc.contributor.imecauthor | Lee, Inhwan | |
| dc.contributor.imecauthor | Franke, Joern-Holger | |
| dc.contributor.imecauthor | Philipsen, Vicky | |
| dc.contributor.imecauthor | Ronse, Kurt | |
| dc.contributor.imecauthor | De Gendt, Stefan | |
| dc.contributor.imecauthor | Hendrickx, Eric | |
| dc.contributor.orcidimec | Lee, Inhwan::0000-0002-3283-5075 | |
| dc.contributor.orcidimec | Franke, Joern-Holger::0000-0002-3571-1633 | |
| dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
| dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
| dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
| dc.contributor.orcidimec | Hendrickx, Eric::0000-0003-2516-0417 | |
| dc.date.accessioned | 2025-07-31T04:00:38Z | |
| dc.date.available | 2025-07-31T04:00:38Z | |
| dc.date.issued | 2025 | |
| dc.identifier.doi | 10.1117/12.3051144 | |
| dc.identifier.eisbn | 978-1-5106-8635-9 | |
| dc.identifier.isbn | 978-1-5106-8634-2 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/45992 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.conference | 2025 Conference on Optical and EUV Nanolithography | |
| dc.source.conferencedate | FEB 24-27, 2025 | |
| dc.source.conferencelocation | San Jose | |
| dc.source.numberofpages | 18 | |
| dc.source.volume | 13424 | |
| dc.title | Extending logic metal printing with sub-resolution grating in high and hyper NA EUV lithography | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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