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Extending logic metal printing with sub-resolution grating in high and hyper NA EUV lithography

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dc.contributor.authorLee, Inhwan
dc.contributor.authorFranke, Joern-Holger
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorRonse, Kurt
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHendrickx, Eric
dc.contributor.imecauthorLee, Inhwan
dc.contributor.imecauthorFranke, Joern-Holger
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecLee, Inhwan::0000-0002-3283-5075
dc.contributor.orcidimecFranke, Joern-Holger::0000-0002-3571-1633
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecHendrickx, Eric::0000-0003-2516-0417
dc.date.accessioned2025-07-31T04:00:38Z
dc.date.available2025-07-31T04:00:38Z
dc.date.issued2025
dc.identifier.doi10.1117/12.3051144
dc.identifier.eisbn978-1-5106-8635-9
dc.identifier.isbn978-1-5106-8634-2
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45992
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.conference2025 Conference on Optical and EUV Nanolithography
dc.source.conferencedateFEB 24-27, 2025
dc.source.conferencelocationSan Jose
dc.source.numberofpages18
dc.source.volume13424
dc.title

Extending logic metal printing with sub-resolution grating in high and hyper NA EUV lithography

dc.typeProceedings paper
dspace.entity.typePublication
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