Publication:
Quantification of line-edge roughness of photoresists. I: A comparison between off-line and on-line analysis of top-down scanning electron microscopy images
Date
| dc.contributor.author | Patsis, G.P. | |
| dc.contributor.author | Constantoudis, V. | |
| dc.contributor.author | Tserepi, A. | |
| dc.contributor.author | Gogolides, E. | |
| dc.contributor.author | Grozev, Grozdan | |
| dc.contributor.imecauthor | Grozev, Grozdan | |
| dc.date.accessioned | 2021-10-15T06:02:47Z | |
| dc.date.available | 2021-10-15T06:02:47Z | |
| dc.date.issued | 2003 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7984 | |
| dc.source.beginpage | 1008 | |
| dc.source.endpage | 1018 | |
| dc.source.issue | 3 | |
| dc.source.journal | Journal of Vacuum Science & Technology B | |
| dc.source.volume | 21 | |
| dc.title | Quantification of line-edge roughness of photoresists. I: A comparison between off-line and on-line analysis of top-down scanning electron microscopy images | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |