Publication:
Sub nanometer depth resolution profiling of the evolution and annealing of damage and the dopant redistribution of ultra-shallow As and Sb implants in Si
Date
| dc.contributor.author | van den Berg, J.A. | |
| dc.contributor.author | Werner, M. | |
| dc.contributor.author | Armour, D.G. | |
| dc.contributor.author | Vandervorst, Wilfried | |
| dc.contributor.author | Clarysse, Trudo | |
| dc.contributor.author | Collart, E.H.J. | |
| dc.contributor.author | Goldberg, R.D. | |
| dc.contributor.author | Bailey, P. | |
| dc.contributor.author | Noakes, T.C. | |
| dc.contributor.imecauthor | Vandervorst, Wilfried | |
| dc.date.accessioned | 2021-10-15T07:09:03Z | |
| dc.date.available | 2021-10-15T07:09:03Z | |
| dc.date.issued | 2003 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/8255 | |
| dc.source.beginpage | 446 | |
| dc.source.conference | Ultra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic. | |
| dc.source.conferencedate | 27/04/2003 | |
| dc.source.conferencelocation | Santa Cruz, CA USA | |
| dc.title | Sub nanometer depth resolution profiling of the evolution and annealing of damage and the dopant redistribution of ultra-shallow As and Sb implants in Si | |
| dc.type | Meeting abstract | |
| dspace.entity.type | Publication | |
| Files | ||
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