Publication:

Freeform illumination sources: Source mask optimization for 22 nm node SRAM

Date

2009
Proceedings Paper
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dc.contributor.authorBekaert, Joost
dc.contributor.authorLaenens, Bart
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorVan Look, Lieve
dc.contributor.authorTrivkovic, Darko
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorVan Adrichem, Paul
dc.contributor.authorSocha, Robert
dc.contributor.authorMulder, M.
dc.contributor.authorBaron, Stanislas
dc.contributor.authorTsai, Min-Chun
dc.contributor.authorNing, Kai
dc.contributor.authorHsu, Stephen
dc.contributor.authorBouma, A.
dc.contributor.authorvan der Heijden, E.
dc.contributor.authorSchreel, Koen
dc.contributor.authorCarpaij, R.
dc.contributor.authorDusa, Mircea
dc.contributor.authorZimmerman, Joerg
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorTrivkovic, Darko
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorVan Adrichem, Paul
dc.contributor.imecauthorDusa, Mircea
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.date.accessioned2021-10-17T21:21:24Z
dc.date.available2021-10-17T21:21:24Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14966
dc.source.conference6th International Symposium on Immersion Lithography Extensions
dc.source.conferencedate22/10/2009
dc.source.conferencelocationPrague Czech Republic
dc.title

Freeform illumination sources: Source mask optimization for 22 nm node SRAM

dc.typeProceedings paper
dspace.entity.typePublication
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