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Fabrication of photonic crystals in silicon-on-insulator using 248-nm deep UV lithography

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dc.contributor.authorBogaerts, Wim
dc.contributor.authorWiaux, Vincent
dc.contributor.authorTaillaert, Dirk
dc.contributor.authorBeckx, Stephan
dc.contributor.authorLuyssaert, Bert
dc.contributor.authorBienstman, P.
dc.contributor.authorBaets, Roel
dc.contributor.imecauthorBogaerts, Wim
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorBaets, Roel
dc.contributor.orcidimecBogaerts, Wim::0000-0003-1112-8950
dc.contributor.orcidimecBaets, Roel::0000-0003-1266-1319
dc.date.accessioned2021-10-14T21:10:35Z
dc.date.available2021-10-14T21:10:35Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6047
dc.source.beginpage928
dc.source.endpage934
dc.source.issue4
dc.source.journalIEEE J. Selected Topics in Quantum Electronics
dc.source.volume8
dc.title

Fabrication of photonic crystals in silicon-on-insulator using 248-nm deep UV lithography

dc.typeJournal article
dspace.entity.typePublication
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