Publication:
Photoresist challenges for logic and memory using 0.33NA EUV lithography
Date
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0009-0001-2424-1322 | |
| cris.virtual.orcid | 0000-0003-3927-5207 | |
| cris.virtualsource.department | b4f8c238-ae6a-4a36-b09f-6a93bec3afa5 | |
| cris.virtualsource.department | ffad9b55-9af5-4edb-8c86-134820dc8dd9 | |
| cris.virtualsource.orcid | b4f8c238-ae6a-4a36-b09f-6a93bec3afa5 | |
| cris.virtualsource.orcid | ffad9b55-9af5-4edb-8c86-134820dc8dd9 | |
| dc.contributor.author | De Simone, Danilo | |
| dc.contributor.author | Vandenberghe, Geert | |
| dc.contributor.imecauthor | De Simone, Danilo | |
| dc.contributor.imecauthor | Vandenberghe, Geert | |
| dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
| dc.date.accessioned | 2021-10-27T08:33:48Z | |
| dc.date.available | 2021-10-27T08:33:48Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2019 | |
| dc.identifier.issn | 0914-9244 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/32836 | |
| dc.identifier.url | https://doi.org/10.2494/photopolymer.32.87 | |
| dc.source.beginpage | 87 | |
| dc.source.endpage | 91 | |
| dc.source.issue | 1 | |
| dc.source.journal | Journal of Photopolymer Science and Technology | |
| dc.source.volume | 32 | |
| dc.title | Photoresist challenges for logic and memory using 0.33NA EUV lithography | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | Original bundle
| |
| Publication available in collections: |