Publication:

Analysis of EUV mask multilayer defect printing characteristics

Date

2012
Proceedings Paper
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cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0003-2211-9443
cris.virtualsource.department386aec34-c796-442e-8812-e827cd030994
cris.virtualsource.orcid386aec34-c796-442e-8812-e827cd030994
dc.contributor.authorErdmann, Andreas
dc.contributor.authorEvanschitzky, Peter
dc.contributor.authorBret, Tristan
dc.contributor.authorJonckheere, Rik
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.accessioned2021-10-20T10:55:45Z
dc.date.available2021-10-20T10:55:45Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20658
dc.source.beginpage83220E
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography III
dc.source.conferencedate12/02/2012
dc.source.conferencelocationSan Jose, CA USA
dc.title

Analysis of EUV mask multilayer defect printing characteristics

dc.typeProceedings paper
dspace.entity.typePublication
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