Publication:

Recent advances in wafer cleaning

Date

2001
Proceedings Paper
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dc.contributor.authorMertens, Paul
dc.contributor.authorVos, Rita
dc.contributor.authorBearda, Twan
dc.contributor.authorMaes, Marjan
dc.contributor.authorLauerhaas, Jeff
dc.contributor.authorLoewenstein, Lee
dc.contributor.authorFyen, Wim
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorKenis, Karine
dc.contributor.authorXu, Kaidong
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorArnauts, Sophia
dc.contributor.authorSchmidt, Michael
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVos, Rita::0000-0003-2610-3406
dc.date.accessioned2021-10-14T17:20:03Z
dc.date.available2021-10-14T17:20:03Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5474
dc.source.conferenceProceedings SEMI Front End Technology Conference
dc.source.conferencedate24/04/2001
dc.source.conferencelocationMünchen Germany
dc.title

Recent advances in wafer cleaning

dc.typeProceedings paper
dspace.entity.typePublication
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