Publication:

Precuring implant photoresists for shrink and patterning control

Date

2013
Proceedings Paper
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dc.contributor.authorWinroth, Gustaf
dc.contributor.authorRosseel, Erik
dc.contributor.authorDelvaux, Christie
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorErcken, Monique
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorErcken, Monique
dc.date.accessioned2021-10-21T14:37:57Z
dc.date.available2021-10-21T14:37:57Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23396
dc.source.beginpage868207
dc.source.conferenceAdvances in Resist Materials and Processing Technology XXX
dc.source.conferencedate24/02/2013
dc.source.conferencelocationSan Diego, CA USA
dc.title

Precuring implant photoresists for shrink and patterning control

dc.typeProceedings paper
dspace.entity.typePublication
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