Continued Optimization of Point-Of-Use Filtration for Metal Oxide Photoresists to Reduce Defect Density

dc.contributor.author	Kohyama, T.
dc.contributor.author	Chang, Shu-Hao
dc.contributor.author	Doise, Jan
dc.contributor.author	Kocsis, Michael
dc.contributor.author	De Schepper, Peter
dc.contributor.author	Foubert, Philippe
dc.contributor.imecauthor	Foubert, Philippe
dc.date.accessioned	2024-03-07T15:08:50Z
dc.date.available	2023-07-28T17:40:05Z
dc.date.available	2024-03-07T15:08:50Z
dc.date.issued	2023
dc.identifier.doi	10.1117/12.2657509
dc.identifier.eisbn	978-1-5106-6104-2
dc.identifier.isbn	978-1-5106-6103-5
dc.identifier.issn	0277-786X
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/42241
dc.publisher	SPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage	Art. 124980A
dc.source.conference	Conference on Advances in Patterning Materials and Processes XL
dc.source.conferencedate	FEB 27-MAR 01, 2023
dc.source.conferencelocation	San Jose
dc.source.journal	Proceedings of SPIE
dc.source.numberofpages	6
dc.source.volume	12498
dc.title	Continued Optimization of Point-Of-Use Filtration for Metal Oxide Photoresists to Reduce Defect Density
dc.type	Proceedings paper
dspace.entity.type	Publication
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